Influence of Na2Si2O5 on the Hydration of C4AF with Various Surface Areas

Kwans Suk you; Hirotaka fujimori; Koji Ioku; Seishi goto

doi:10.2472/jsms.51.6Appendix_64

Influence of Na₂Si₂O₅ on the Hydration of C4AF with Various Surface Areas

Kwans Suk you, Hirotaka fujimori, Koji Ioku, Seishi goto

研究成果: Article › 査読

抄録

The hydration of C4AF having various surface areas was investigated with Na₂Si₂O₅ solution. The hydration behavior of C4AF depended on the amount of silicate ions precipitated on its surface. The amount of precipitated silicate ions, which hindered the hydration of C4AF, was proportional to the surface area of C4AF. The precipitated silicate ions on the surface of C4AF were founded to be a silica-like material by means of X-ray photoelectron spectroscopy (XPS). They formed a layer approximately 3 nm thick on the surface of C4AF.

本文言語	English
ページ（範囲）	64-67
ページ数	4
ジャーナル	Zairyo/Journal of the Society of Materials Science, Japan
巻	51
DOI	https://doi.org/10.2472/jsms.51.6Appendix_64
出版ステータス	Published - 2002
外部発表	はい

ASJC Scopus subject areas

材料科学（全般）
凝縮系物理学
材料力学
機械工学

文献へのアクセス

10.2472/jsms.51.6Appendix_64

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abstract = "The hydration of C4AF having various surface areas was investigated with Na2Si2O5 solution. The hydration behavior of C4AF depended on the amount of silicate ions precipitated on its surface. The amount of precipitated silicate ions, which hindered the hydration of C4AF, was proportional to the surface area of C4AF. The precipitated silicate ions on the surface of C4AF were founded to be a silica-like material by means of X-ray photoelectron spectroscopy (XPS). They formed a layer approximately 3 nm thick on the surface of C4AF.",

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AU - goto, Seishi

PY - 2002

Y1 - 2002

N2 - The hydration of C4AF having various surface areas was investigated with Na2Si2O5 solution. The hydration behavior of C4AF depended on the amount of silicate ions precipitated on its surface. The amount of precipitated silicate ions, which hindered the hydration of C4AF, was proportional to the surface area of C4AF. The precipitated silicate ions on the surface of C4AF were founded to be a silica-like material by means of X-ray photoelectron spectroscopy (XPS). They formed a layer approximately 3 nm thick on the surface of C4AF.

AB - The hydration of C4AF having various surface areas was investigated with Na2Si2O5 solution. The hydration behavior of C4AF depended on the amount of silicate ions precipitated on its surface. The amount of precipitated silicate ions, which hindered the hydration of C4AF, was proportional to the surface area of C4AF. The precipitated silicate ions on the surface of C4AF were founded to be a silica-like material by means of X-ray photoelectron spectroscopy (XPS). They formed a layer approximately 3 nm thick on the surface of C4AF.

KW - Ferrite phase

KW - Hydration reaction

KW - Retardation

KW - Silica layer

KW - Sodium silicate

KW - Surface area

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