Influence of Na2Si2O5 on the Hydration of C4AF with Various Surface Areas

Kwans Suk you, Hirotaka fujimori, Koji Ioku, Seishi goto

研究成果: Article査読

抄録

The hydration of C4AF having various surface areas was investigated with Na2Si2O5 solution. The hydration behavior of C4AF depended on the amount of silicate ions precipitated on its surface. The amount of precipitated silicate ions, which hindered the hydration of C4AF, was proportional to the surface area of C4AF. The precipitated silicate ions on the surface of C4AF were founded to be a silica-like material by means of X-ray photoelectron spectroscopy (XPS). They formed a layer approximately 3 nm thick on the surface of C4AF.

本文言語English
ページ(範囲)64-67
ページ数4
ジャーナルZairyo/Journal of the Society of Materials Science, Japan
51
DOI
出版ステータスPublished - 2002
外部発表はい

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

フィンガープリント 「Influence of Na<sub>2</sub>Si<sub>2</sub>O<sub>5</sub> on the Hydration of C4AF with Various Surface Areas」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

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