Influence of Na2Si2O5 on the hydration of C4AF with various surface areas

Kwang Suk You, Hirotaka Fujimori, Koji Ioku, Seishi Goto

研究成果: Article査読

2 被引用数 (Scopus)

抄録

The hydration of C4AF having various surface areas was investigated with Na2Si2O5 solution. The hydration behavior of C4AF depended on the amount of silicate ions precipitated on its surface. The amount of precipitated silicate ions, which hindered the hydration of C4AF, was proportional to the surface area of C4AF. The precipitated silicate ions on the surface of C4AF were founded to be a silica-like material by means of X-ray photoelectron spectroscopy (XPS). They formed a layer approximately 3 nm thick on the surface of C4AF.

本文言語English
ページ(範囲)64-67
ページ数4
ジャーナルMaterials Science Research International
8
2
出版ステータスPublished - 2002 6 1
外部発表はい

ASJC Scopus subject areas

  • Materials Science(all)

フィンガープリント 「Influence of Na<sub>2</sub>Si<sub>2</sub>O<sub>5</sub> on the hydration of C<sub>4</sub>AF with various surface areas」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

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