Laser ablation deposition of crystalline copper-phthalocyanine thin films

E. Ina, N. Matsumoto, E. Shikada, F. Kannari

研究成果: Article査読

26 被引用数 (Scopus)

抄録

The poor crystallinity of copper-phthalocyanine (CuPc) thin films fabricated via KrF laser ablation is significantly improved by three different assisting methods applied during deposition: (1) elevating substrate temperature only up to 50°C; (2) irradiating with HeNe laser of ∼ 200 μW/cm 2 ; (3) applying DC electric field. Highest crystallinity is obtained when the film is deposited under DC electric field of ∼ 50 V/cm in the direction of film thickness. This in-process electric poling also works for 4-dialkylamino-4′-nitrostilbensen (DANS) film.

本文言語English
ページ(範囲)574-578
ページ数5
ジャーナルApplied Surface Science
127-129
DOI
出版ステータスPublished - 1998 5月

ASJC Scopus subject areas

  • 化学 (全般)
  • 凝縮系物理学
  • 物理学および天文学(全般)
  • 表面および界面
  • 表面、皮膜および薄膜

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