Liquid phase deposition of a film of silica with an organic functional group

Koji Tsukuma, Tomoyuki Akiyama, Nobusuke Yamada, Hiroaki Imai

研究成果: Article査読

17 被引用数 (Scopus)

抄録

The thin films of silica with an organic functional group, -CH3,-CH=CH2, -C2H4CF3, were produced by a deposition method. In this method, the film was formed on a substrate in a solution above room temperature. The dilute solution containing organotrimethoxysilane (Si concentration 0.03 mol/1) was utilized. The addition of NH4F promoted the film growth. The deposition film was not formed in the solution containing tetramethoxysilane. Therefore, it is assumed that the role of organic functional group is important in initiating the deposition process.

本文言語English
ページ(範囲)161-168
ページ数8
ジャーナルJournal of Non-Crystalline Solids
231
1-2
DOI
出版ステータスPublished - 1998 7月 1

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • セラミックおよび複合材料
  • 凝縮系物理学
  • 材料化学

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