Magnetic mesa structures fabricated by reactive ion etching with CO/NH 3/Xe plasma chemistry for an all-silicon quantum computer

Dong F. Wang, Atsushi Takahashi, Yoshinori Matsumoto, Kohei M. Itoh, Yoshihisa Yamamoto, Takahito Ono, Masayoshi Esashi

研究成果: Article査読

7 被引用数 (Scopus)

抄録

Micromachining of magnetic materials is becoming a crucial technology for future magnetic systems/devices such as high-density magnetic recording heads, high-density patterned media, magnetic quantum devices, and micro-magnetic smart systems. NiFe alloy, one of the typical ferromagnetic materials, can be deposited and fabricated using current thin film and micromachining technologies, and it has found various applications in microsensors, microactuators, and microsystems. In our recent work, Ni45Fe 55 alloy with the highest saturation magnetic-flux density was selected as the micro-magnet for an all-silicon quantum computer. The micro-magnet was designed to create a large magnetic field gradient and to distinguish 29Si nuclear spins arranged as chains in a 28Si matrix with Larmor frequencies. This paper reports the micromachining of a Ni45Fe55 alloy mesa structure for an all-silicon quantum computer and the preliminary evaluation of its effectiveness using a magnetic force microscope (MFM) and a superconducting quantum interference device (SQUID).

本文言語English
ページ(範囲)990-994
ページ数5
ジャーナルNanotechnology
16
6
DOI
出版ステータスPublished - 2005 6月 1

ASJC Scopus subject areas

  • バイオエンジニアリング
  • 化学 (全般)
  • 材料科学(全般)
  • 材料力学
  • 機械工学
  • 電子工学および電気工学

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