Mechanism of N + NO Reaction on Rh(111) surfaces: A precursor-mediated reaction

Ikuyo Nakai, Hiroshi Kondoh, Toru Shimada, Masanari Nagasaka, Reona Yokota, Tetsuo Katayama, Kenta Amemiya, Hideo Orita, Toshiaki Ohta

研究成果: Article

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We studied the mechanism of the N + NO reaction on Rh(111) surfaces by means of near edge X-ray absorption fine structure (NEXAFS) spectroscopy. Atomic nitrogen layers on Rh(111) were titrated with NO at various temperatures. Below 350 K, the chemisorbed NO monomer does not react with N, while the NO dimer formed in the second layer acts as an extrinsic precursor to the reaction: N(a) + (NO)2(a)→N2O(g) + NO(a). Because of a dominant role of the precursor-mediated mechanism, the reaction proceeds slower with an increase in temperature. Above 350 K, the reaction switches to a different path: N(a) + NO(a) → N2(g) + O(a). ?.

元の言語English
ページ(範囲)13257-13265
ページ数9
ジャーナルJournal of Physical Chemistry C
113
発行部数30
DOI
出版物ステータスPublished - 2009 7 30

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Energy(all)
  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films

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    Nakai, I., Kondoh, H., Shimada, T., Nagasaka, M., Yokota, R., Katayama, T., Amemiya, K., Orita, H., & Ohta, T. (2009). Mechanism of N + NO Reaction on Rh(111) surfaces: A precursor-mediated reaction. Journal of Physical Chemistry C, 113(30), 13257-13265. https://doi.org/10.1021/jp902583x