Mechanism of N + NO Reaction on Rh(111) surfaces: A precursor-mediated reaction

Ikuyo Nakai, Hiroshi Kondoh, Toru Shimada, Masanari Nagasaka, Reona Yokota, Tetsuo Katayama, Kenta Amemiya, Hideo Orita, Toshiaki Ohta

研究成果: Article査読

22 被引用数 (Scopus)

抄録

We studied the mechanism of the N + NO reaction on Rh(111) surfaces by means of near edge X-ray absorption fine structure (NEXAFS) spectroscopy. Atomic nitrogen layers on Rh(111) were titrated with NO at various temperatures. Below 350 K, the chemisorbed NO monomer does not react with N, while the NO dimer formed in the second layer acts as an extrinsic precursor to the reaction: N(a) + (NO)2(a)→N2O(g) + NO(a). Because of a dominant role of the precursor-mediated mechanism, the reaction proceeds slower with an increase in temperature. Above 350 K, the reaction switches to a different path: N(a) + NO(a) → N2(g) + O(a). ?.

本文言語English
ページ(範囲)13257-13265
ページ数9
ジャーナルJournal of Physical Chemistry C
113
30
DOI
出版ステータスPublished - 2009 7 30

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • エネルギー(全般)
  • 物理化学および理論化学
  • 表面、皮膜および薄膜

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