Eight kinds of targets with differing Al contents were used to synthesize Cr1-xAlxN films by the arc ion plating (AIP) method. Investigation of microhardness, microstructures, and lattice parameters of films was done by changing x values and analyzed by x-ray diffraction (XRD) method and scanning electron microscopy (SEM). Cross-sectional SEM observation of films showed that for all Cr1-xAlxN films, deposited for 20 min, microstructure drastically changed between x = 0.6 and 0.7, and had similar thickness of 5 to 6 μm.
|ジャーナル||Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films|
|出版ステータス||Published - 2002 3月|
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