TY - JOUR
T1 - Microhardness and lattice parameter of Cr1-xAlxN films
AU - Kawate, Masahiro
AU - Kimura, Ayako
AU - Suzuki, Tetsuya
N1 - Copyright:
Copyright 2008 Elsevier B.V., All rights reserved.
PY - 2002/3
Y1 - 2002/3
N2 - Eight kinds of targets with differing Al contents were used to synthesize Cr1-xAlxN films by the arc ion plating (AIP) method. Investigation of microhardness, microstructures, and lattice parameters of films was done by changing x values and analyzed by x-ray diffraction (XRD) method and scanning electron microscopy (SEM). Cross-sectional SEM observation of films showed that for all Cr1-xAlxN films, deposited for 20 min, microstructure drastically changed between x = 0.6 and 0.7, and had similar thickness of 5 to 6 μm.
AB - Eight kinds of targets with differing Al contents were used to synthesize Cr1-xAlxN films by the arc ion plating (AIP) method. Investigation of microhardness, microstructures, and lattice parameters of films was done by changing x values and analyzed by x-ray diffraction (XRD) method and scanning electron microscopy (SEM). Cross-sectional SEM observation of films showed that for all Cr1-xAlxN films, deposited for 20 min, microstructure drastically changed between x = 0.6 and 0.7, and had similar thickness of 5 to 6 μm.
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U2 - 10.1116/1.1448510
DO - 10.1116/1.1448510
M3 - Article
AN - SCOPUS:0036494572
VL - 20
SP - 569
EP - 571
JO - Journal of Vacuum Science and Technology A
JF - Journal of Vacuum Science and Technology A
SN - 0734-2101
IS - 2
ER -