Microhardness and lattice parameter of Cr1-xAlxN films

Masahiro Kawate, Ayako Kimura, Tetsuya Suzuki

研究成果: Article査読

100 被引用数 (Scopus)

抄録

Eight kinds of targets with differing Al contents were used to synthesize Cr1-xAlxN films by the arc ion plating (AIP) method. Investigation of microhardness, microstructures, and lattice parameters of films was done by changing x values and analyzed by x-ray diffraction (XRD) method and scanning electron microscopy (SEM). Cross-sectional SEM observation of films showed that for all Cr1-xAlxN films, deposited for 20 min, microstructure drastically changed between x = 0.6 and 0.7, and had similar thickness of 5 to 6 μm.

本文言語English
ページ(範囲)569-571
ページ数3
ジャーナルJournal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
20
2
DOI
出版ステータスPublished - 2002 3

ASJC Scopus subject areas

  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜

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