Microhardness and lattice parameter of Cr1-xAlxN films

Masahiro Kawate; Ayako Kimura; Tetsuya Suzuki

doi:10.1116/1.1448510

Microhardness and lattice parameter of Cr_1-xAl_xN films

Masahiro Kawate, Ayako Kimura, Tetsuya Suzuki

機械工学科

研究成果: Article › 査読

100 被引用数 (Scopus)

抄録

Eight kinds of targets with differing Al contents were used to synthesize Cr_1-xAl_xN films by the arc ion plating (AIP) method. Investigation of microhardness, microstructures, and lattice parameters of films was done by changing x values and analyzed by x-ray diffraction (XRD) method and scanning electron microscopy (SEM). Cross-sectional SEM observation of films showed that for all Cr_1-xAl_xN films, deposited for 20 min, microstructure drastically changed between x = 0.6 and 0.7, and had similar thickness of 5 to 6 μm.

本文言語	English
ページ（範囲）	569-571
ページ数	3
ジャーナル	Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
巻	20
号	2
DOI	https://doi.org/10.1116/1.1448510
出版ステータス	Published - 2002 3

ASJC Scopus subject areas

凝縮系物理学
表面および界面
表面、皮膜および薄膜

文献へのアクセス

10.1116/1.1448510

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引用スタイル

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