Micropatterning of Silica Nanoparticles by Electrospray Deposition through a Stencil Mask

Kazuhiko Higashi, Kazuhiro Uchida, Atsushi Hotta, Koichi Hishida, Norihisa Miki

研究成果: Article査読

12 被引用数 (Scopus)

抄録

This article describes the local deposition, or micropatterning, of silica nanoparticles (NPs) using an electrospray method with a stencil mask. The proposed technique can be carried out in a single step at room temperature and atmospheric pressure under dry conditions, allowing it to be used with water- or vacuum-sensitive materials, and leading to cost reductions and high throughput. An evaluation of the patterning accuracy using a 20 μm thick mask showed that for patterns with line widths greater than 50 μm, the pattern was reproduced with an accuracy greater than 95%. When silver NPs were preferably deposited on the silica NPs using a modified silver mirror reaction, they were found to exhibit strong surface-enhanced Raman scattering effects. The proposed process is readily applicable to the development of high-performance micro total analysis systems.

本文言語English
ページ(範囲)75-81
ページ数7
ジャーナルJournal of Laboratory Automation
19
1
DOI
出版ステータスPublished - 2014 2

ASJC Scopus subject areas

  • コンピュータ サイエンスの応用
  • 医療検査技術

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