Single crystal diamond is expected to be a new material for not only micromachining tools, but also innovative microelectromechanical systems (MEMS). In this paper, we propose a new method for micro-patterning of bulk diamond by exploiting the thermochemical reaction between diamond and sidero-metals. We demonstrate the micro-patterning of single crystal diamond by annealing at temperatures from 1073 K to 1173 K after either micro-patterning nickel on the diamond or placing the diamond on a silicon substrate with a micro-patterned nickel layer. The nickel patterning, and thus the diamond patterning, can be conducted in a mass producible manner using photolithography. Etching rates greater than 0.2 μm/min were successfully achieved. The etching mechanisms were also experimentally elucidated, with oxygen playing a crucial role in the etching processes.
|出版ステータス||Published - 2011 7 1|
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