Modeling of physical etching based on the two-dimensional velocity distributions of ions and fast neutrals using the Boltzmann equation

Tadashi Tokonami, Toshiaki Makabe

研究成果: Article査読

17 被引用数 (Scopus)

抄録

A numerical model based on the Boltzmann equation is proposed to simulate the physical etching by energetic particles in the sheath region of the discharge. The local profiles of the two-dimensional velocity distributions of ions and fast neutrals in the gas phase are calculated in a radially uniform discharge, under a set of collision cross sections, for external parameters: sheath voltage and width, ion current density, and pressure. A case study is performed in a dc abnormal glow discharge in Ar having a masked Al electrode. The time evolution of the etching profile is simulated as a result of the physical interaction between the surface and energetic particles from the gas phase. This enables the estimation of the etch rate and anisotropy for ions and fast neutrals. A great advantage of the present numerical procedure is that it is free from stochastic fluctuations and the lengthy central processing unit time found in particle simulations.

本文言語English
ページ(範囲)3323-3329
ページ数7
ジャーナルJournal of Applied Physics
72
8
DOI
出版ステータスPublished - 1992

ASJC Scopus subject areas

  • 物理学および天文学(全般)

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