Modification and densification of sol-gel derived silica films at low temperatures

Hiroaki Imai, Hiroshi Hirashima, Koichi Awazu, Hideo Onuki

研究成果: Conference article査読

2 被引用数 (Scopus)

抄録

Relatively new modification methods for densification of sol-gel derived silica films using electronic excitations and water vapor were investigated. Dried silica gel films were found to be densified by vacuum ultraviolet irradiation and He+ ion implantation. The densification is deduced to be ascribed to dehydration and cleavage of the strained bonds through electronic excitations induced by the irradiations. The structure of the irradiated silica films is similar to that of silica glass densified under a high pressure. The exposure to water vapor at 80° -180°C is also effective in densification and dehydration of sol-gel silica films. These methods are expected to be valuable for fabrication of dense silica films at low temperatures. However, the silica films densified by the irradiations and the exposure are suggested to contain a strained network because a subsequent annealing above 300°C induced structural changes through a thermal relaxation.

本文言語English
ページ(範囲)144-149
ページ数6
ジャーナルProceedings of SPIE - The International Society for Optical Engineering
3136
DOI
出版ステータスPublished - 1997 12月 1
イベントSol-Gel Optics IV - San Diego, CA, United States
継続期間: 1997 7月 301997 8月 1

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • コンピュータ サイエンスの応用
  • 応用数学
  • 電子工学および電気工学

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