Modulated potential field for position adjusting with human interaction for implant surgery

Koyo Yu, Tomohiro Nakano, Kouhei Ohnishi, Shin Usuda, Taneaki Nakagawa, Hiromasa Kawana

研究成果: Conference contribution

1 引用 (Scopus)

抜粋

Image processing and robotics are leading technologies to improve dental surgery. The important information for physicians to perform implant surgery is 'where to start cutting' and 'when to stop cutting'. The aim of this research is to achieve automatic guide system for teaching the information of 'where to start cutting'. To achieve this aim, L-J potential field, which can realize required performance of position adjustment with human interaction are proposed in this paper. Proposed potential field has three features. First, physician can free moving the manipulator when far from the distinction. Second, the manipulator will apply adjusting force for correctly converges to the destination when approaching to the distinction. Third, the manipulator will apply adjusting force for collision avoidance when passing the distinction. The validity of proposed L-J potential are confirmed through experiment using 2DOF parallel link manipulator.

元の言語English
ホスト出版物のタイトルProceedings - 2015 IEEE International Conference on Mechatronics, ICM 2015
出版者Institute of Electrical and Electronics Engineers Inc.
ページ234-239
ページ数6
ISBN(電子版)9781479936335
DOI
出版物ステータスPublished - 2015 4 9
イベント2015 IEEE International Conference on Mechatronics, ICM 2015 - Nagoya, Japan
継続期間: 2015 3 62015 3 8

出版物シリーズ

名前Proceedings - 2015 IEEE International Conference on Mechatronics, ICM 2015

Other

Other2015 IEEE International Conference on Mechatronics, ICM 2015
Japan
Nagoya
期間15/3/615/3/8

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Mechanical Engineering

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  • これを引用

    Yu, K., Nakano, T., Ohnishi, K., Usuda, S., Nakagawa, T., & Kawana, H. (2015). Modulated potential field for position adjusting with human interaction for implant surgery. : Proceedings - 2015 IEEE International Conference on Mechatronics, ICM 2015 (pp. 234-239). [7083980] (Proceedings - 2015 IEEE International Conference on Mechatronics, ICM 2015). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/ICMECH.2015.7083980