MR measurement of sub-micron scale relief structures fabricated in GMR materials

K. Matsuyama, Y. Nozaki, T. Misumi

研究成果: Conference article

2 引用 (Scopus)

抜粋

Understanding of magnetization process in patterned thin films is important for their applications in downsizing various magnetic devices. This paper deals with an experimental technique which enables us to characterize magnetization process in the ends of patterned ultra-thin films. In this study, only the top layer of magnetic sandwich structures were patterned into an array of fine magnetic particles using electron beam lithography and Ar ion milling to form relief structures in the films. The magnetization process of the arrays was inferred from magnetoresistance (MR) measurements of the films. MR behaviors of particle array samples of substrate/FM1/Cu/FM2 (FM1, FM2 = Co, NiFe, CoPt) in different pattern widths of ω = 0.2 and 0.6 μm, lengths L ranging from 0.2 to 280 μm and thicknesses of t = 6 and 18 nm were studied. From longitudinal MR measurements, a distinct decrease in remanent magnetization was found for sub-μm particle arrays, which may be associated with the formation of edge domains in the particles.

元の言語English
ページ(範囲)2114-2116
ページ数3
ジャーナルIEEE Transactions on Magnetics
37
発行部数4 I
DOI
出版物ステータスPublished - 2001 7 1
外部発表Yes
イベント8th Joint Magnetism and Magnetic Materials -International Magnetic Conference- (MMM-Intermag) - San Antonio, TX, United States
継続期間: 2001 1 72001 1 11

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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