Multidirectional UV lithography via inclined/rotated mirrors for liquid materials

Takumi Sugimito, Hidetoshi Takahashi

研究成果: Article査読

2 被引用数 (Scopus)

抄録

This letter presents the development of an exposure equipment for inclined/rotating lithography with UV curable liquid materials. The proposed equipment is composed of inclined mirrors rotating around exposure spot and shading plate to prevent direct vertical irradiated UV light. UV light ray is reflected on the mirrors, and irradiate to the spot with inclined angle via rotation. During mirrors rotating, UV curable material located on the exposure spot keeps a quiet state. The incident angle of UV light ray is controllable by changing the mirror inclination. We developed an equipment and conducted an experiment for the fabrication of 3D structures with PEGDA.

本文言語English
論文番号076502
ジャーナルApplied Physics Express
13
7
DOI
出版ステータスPublished - 2020 7 1

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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