Near-field optical polarization microscopy in internal-reflection configuration with ultrasmall aperture probe

研究成果: Conference contribution

抄録

Summary form only given. Polarization-sensitive imaging using near-field scanning optical microscopy (NSOM) is a fundamental method for the magneto-optical study of micro-structures. The polarization NSOM also offers another contrast mechanism based on the depolarization effect due to the near-field tip-sample interaction. For achievement of higher resolution and application to opaque materials, internal-reflection NSOM (IR-NSOM) with an aperture probe is the most promising technique. Here, we demonstrate the operation of IR-NSOM through the investigation of phase-change recording media. By obtaining background suppression as high as 10-5, amorphous marks are clearly imaged with an optical contrast higher than that in conventional far-field configuration.

本文言語English
ホスト出版物のタイトルTechnical Digest - Summaries of Papers Presented at the Quantum Electronics and Laser Science Conference, QELS 2001
出版社Institute of Electrical and Electronics Engineers Inc.
ページ80
ページ数1
ISBN(印刷版)155752663X, 9781557526632
DOI
出版ステータスPublished - 2001
外部発表はい
イベントQuantum Electronics and Laser Science Conference, QELS 2001 - Baltimore, United States
継続期間: 2001 5 62001 5 11

Other

OtherQuantum Electronics and Laser Science Conference, QELS 2001
CountryUnited States
CityBaltimore
Period01/5/601/5/11

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Radiation

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