N+NO reaction on Rh(111) surfaces studied with fast near-edge X-ray absorption fine structure spectroscopy: Role of NO dimer as an extrinsic precursor

Ikuyo Nakai, Hiroshi Kondoh, Toru Shimada, Masanari Nagasaka, Reona Yokota, Kenta Amemiya, Hideo Orita, Toshiaki Ohta

研究成果: Article査読

16 被引用数 (Scopus)

抄録

We studied the mechanism of the N+NO reaction on Rh(111) surfaces by means of fast near-edge X-ray absorption fine structure spectroscopy. This reaction is important as a basis of NOx reduction reactions on platinum-group metal surfaces. Atomic nitrogen layers on Rh(111) were titrated with NO at various temperatures. N2O is exclusively formed and desorbs into the gas phase below 350 K. The consumption rate of atomic nitrogen exhibits strange temperature dependence between 100 and 350 K; the reaction proceeds slower with increasing temperature. Reaction kinetics analyses and isotope-controlled experiments have revealed that the surface N atoms do not react with chemisorbed NO molecules but with NO dimers weakly bound on top of the chemisorbed layer, which play a role as an extrinsic precursor. The present results may support the possibility that NO dimers participate in various NO-related synthetic, biochemical, and surface reactions as an intermediate.

本文言語English
ページ(範囲)25578-25581
ページ数4
ジャーナルJournal of Physical Chemistry B
110
51
DOI
出版ステータスPublished - 2006 12 28
外部発表はい

ASJC Scopus subject areas

  • 物理化学および理論化学
  • 表面、皮膜および薄膜
  • 材料化学

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