Silica platelets (Corning 7940) were implanted sequentially with N+ at 52 keV to different doses ranging from 0 to 1.2×1017 ions cm-2 and then with Fe+ at 160 keV to a dose of 6×1016 ions cm-2. The optical absorption decreased with increasing N1 dose at photon energies ranging from 1.4 eV to 6.5 eV. The relative intensity, S(0°), of the ferromagnetic resonance absorption and its resonance field, Hs(0°), at θ = 0° were larger than S(90°) and Hs(90°) at θ = 90°, where θ is the angle between the applied magnetic field and the normal to the implanted surface. The maximum values of S(0°) and S(90°) were observed near the N/Fe atomic ratio of 0.2. At the similar atomic ratio, the differential relative intensity, S(0°)- S(90°), and the differential resonance field, Hs(0°)- Hs(90°), associated with the degree of magnetic interaction between the produced compounds, also showed maxima. We conclude that sequential ion-implantation of N1 and Fe1 into silica causes a chemical interaction to produce iron nitrides.
|ジャーナル||Materials Research Society Symposium - Proceedings|
|出版ステータス||Published - 1996 1月 1|
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