抄録
By combining time-resolved pump-probe reflectivity measurements with scanning laser microscopy, we demonstrate microscopic two-dimensional (2D) imaging of defect density distribution on a GaAs surface. The carrier lifetime is significantly reduced by the recombination process through defect states introduced by 5-keV He+ ion implantation. Thus, when plotting the probe beam reflectivity at 1 ps after photoexcitation and scanning the probe beam across the GaAs surface at a spatial resolution of 2 μm with a scanning step of 10 μm, we obtain a clear image of defect distribution corresponding to a mask edge pattern placed on the sample during ion implantation. Clearer images can be obtained using longer wavelength probe light.
本文言語 | English |
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ページ(範囲) | 184-185 |
ページ数 | 2 |
ジャーナル | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
巻 | 43 |
号 | 1 |
DOI | |
出版ステータス | Published - 2004 1月 |
ASJC Scopus subject areas
- 工学(全般)
- 物理学および天文学(全般)