Oxidation resistance and hardness of TiAlSiN/CrAlYN multilayer films deposited by the arc ion plating method

T. Mori, M. Noborisaka, T. Watanabe, T. Suzuki

研究成果: Article

22 引用 (Scopus)

抜粋

Multilayered TiAlSiN/CrAlYN films were synthesized on cemented carbide, silicon and SUS304 substrates with various periods and investigated their oxidation resistance and hardness. The multilayer period between 5.6. nm and 23.2. nm was obtained by controlling the rotation speed of the substrates. X-ray diffraction patterns showed that the TiAlSiN/CrAlYN multilayer films after annealed at 1000. °C for 1. h retained the nitride structure and no peaks indicating metal oxide were observed for the films. Using the glow discharge optical emission spectrometry depth profiling method, an oxidation peak was only observed around the film surface. Hardness of TiAlSiN/CrAlYN multilayer films was measured using a conventional micro-Vickers hardness tester and the result showed that it changed depending on the multilayer period. That is, the film with a period of 8.7. nm exhibited the highest hardness with 37.1. GPa, which was higher than the value calculated based on the rule of mixtures of TiAlSiN monolayer and CrAlYN monolayer.

元の言語English
ページ(範囲)216-220
ページ数5
ジャーナルSurface and Coatings Technology
213
DOI
出版物ステータスPublished - 2012 12 1

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

フィンガープリント Oxidation resistance and hardness of TiAlSiN/CrAlYN multilayer films deposited by the arc ion plating method' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

  • これを引用