Oxidation resistance of Cr1-xAlxN and Ti1-xAlxN films

Masahiro Kawate, Ayako Kimura Hashimoto, Tetsuya Suzuki

研究成果: Article査読

233 被引用数 (Scopus)

抄録

Cr1-xAlxN films were synthesized on mirror-polished stainless steel substrates by the arc ion plating method using Crl-XAlX alloy targets with diffent Al contents. Oxidation resistance of films was estimated by heating substrates in air at 800, 900 and 1000 °C and subsequent analysis by the X-ray diffraction method (XRD). The XRD peaks from Ti0.7 Al0.3N films, annealed at 800 °C for 14 h, disappeared and the peaks from iron oxides consequently appeared. The oxidation resistance of Ti1-XAlXN films improved with increasing Al content X. On the other hand, the peaks from Cr1-XAlN films which were annealed at 800 8°C did not change at all, but Cr1-XAlXN films were slightly oxidized over 900 °C. It is considered that the oxidation resistance of Cr1-XAlXN films was superior to that of TI1-XAlXN films.

本文言語English
ページ(範囲)163-167
ページ数5
ジャーナルSurface and Coatings Technology
165
2
DOI
出版ステータスPublished - 2003 2 10

ASJC Scopus subject areas

  • 化学 (全般)
  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜
  • 材料化学

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