Particle removal in ultrasonic water flow cleaning: Role of cavitation bubbles as cleaning agents

Keita Ando, Mao Sugawara, Riria Sakota, Tomoatsu Ishibashi, Hisanori Matsuo, Katsuhide Watanabe

研究成果: Conference contribution

抄録

Visualization experiments are performed to examine the role of acoustic cavitation bubbles that appear in 0.43-MHz ultrasonic water flow spreading over glass surfaces in the context of physical cleaning. The cleaning performance is evaluated using glass samples on which small silica particles are spin-coated. The visualization suggests that acoustic cavitation bubbles play a major role in particle removal as in the case of conventional cleaning with ultrasonic cleaning baths.

本文言語English
ホスト出版物のタイトルUltra Clean Processing of Semiconductor Surfaces XV - Selected peer-reviewed full text papers from the 15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021
編集者Paul W. Mertens, Kurt Wostyn, Marc Meuris, Marc Heyns
出版社Trans Tech Publications Ltd
ページ218-221
ページ数4
ISBN(印刷版)9783035738018
DOI
出版ステータスPublished - 2021
イベント15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021 - Mechelen, Belgium
継続期間: 2021 4 122021 4 15

出版物シリーズ

名前Solid State Phenomena
314 SSP
ISSN(印刷版)1012-0394
ISSN(電子版)1662-9779

Conference

Conference15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021
CountryBelgium
CityMechelen
Period21/4/1221/4/15

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Materials Science(all)
  • Condensed Matter Physics

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