Photoinduced hydroxylation at ZnO surface

N. Asakuma, T. Fukui, M. Toki, K. Awazu, H. Imai

研究成果: Conference article査読

41 被引用数 (Scopus)

抄録

We observed UV-stimulated hydroxylation at the surface of ZnO crystals. Reactive defective sites were initially formed in the surface layer via photoreduction induced with energetic photons above the band gap of ZnO. Hydroxyl groups were produced by a chemical reaction of the photoinduced defective sites with water molecules in the atmosphere. Two types of hydroxyl groups were found at the irradiated surface because two kinds of defective sites were induced with the UV illumination.

本文言語English
ページ(範囲)284-287
ページ数4
ジャーナルThin Solid Films
445
2
DOI
出版ステータスPublished - 2003 12 15
イベントProceedings of the 3rd International Symposium on Transparent Oxide - Tokyo, Japan
継続期間: 2003 4 102003 4 11

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 表面および界面
  • 表面、皮膜および薄膜
  • 金属および合金
  • 材料化学

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