Probing buried organic-organic and metal-organic heterointerfaces by hard x-ray photoelectron spectroscopy

Masahiro Shibuta; Toyoaki Eguchi; Yoshio Watanabe; Jin Young Son; Hiroshi Oji; Atsushi Nakajima

doi:10.1063/1.4768940

Probing buried organic-organic and metal-organic heterointerfaces by hard x-ray photoelectron spectroscopy

Masahiro Shibuta, Toyoaki Eguchi, Yoshio Watanabe, Jin Young Son, Hiroshi Oji, Atsushi Nakajima

研究成果: Article › 査読

5 被引用数 (Scopus)

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We present a nondestructive characterization method for buried hetero-interfaces for organic/organic and metal/organic systems using hard x-ray photoelectron spectroscopy (HAXPES) which can probe electronic states at depths deeper than ∼10 nm. A significant interface-derived signal showing a strong chemical interaction is observed for Au deposited onto a C₆₀ film, while there is no such additional feature for copper phthalocyanine deposited onto a C₆₀ film reflecting the weak interaction between the molecules in the latter case. A depth analysis with HAXPES reveals that a Au-C ₆₀ intermixed layer with a thickness of 5.1 nm is formed at the interface.

本文言語	English
論文番号	221603
ジャーナル	Applied Physics Letters
巻	101
号	22
DOI	https://doi.org/10.1063/1.4768940
出版ステータス	Published - 2012 11月 26

ASJC Scopus subject areas

物理学および天文学（その他）

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10.1063/1.4768940

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title = "Probing buried organic-organic and metal-organic heterointerfaces by hard x-ray photoelectron spectroscopy",

abstract = "We present a nondestructive characterization method for buried hetero-interfaces for organic/organic and metal/organic systems using hard x-ray photoelectron spectroscopy (HAXPES) which can probe electronic states at depths deeper than ∼10 nm. A significant interface-derived signal showing a strong chemical interaction is observed for Au deposited onto a C60 film, while there is no such additional feature for copper phthalocyanine deposited onto a C60 film reflecting the weak interaction between the molecules in the latter case. A depth analysis with HAXPES reveals that a Au-C 60 intermixed layer with a thickness of 5.1 nm is formed at the interface.",

author = "Masahiro Shibuta and Toyoaki Eguchi and Yoshio Watanabe and Son, {Jin Young} and Hiroshi Oji and Atsushi Nakajima",

note = "Funding Information: This work is partly supported by MEXT-Supported Program for the Strategic Research Foundation at Private Universities, 2009-2013. Copyright: Copyright 2012 Elsevier B.V., All rights reserved.",

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AU - Shibuta, Masahiro

AU - Eguchi, Toyoaki

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AU - Son, Jin Young

AU - Oji, Hiroshi

AU - Nakajima, Atsushi

N1 - Funding Information: This work is partly supported by MEXT-Supported Program for the Strategic Research Foundation at Private Universities, 2009-2013. Copyright: Copyright 2012 Elsevier B.V., All rights reserved.

PY - 2012/11/26

Y1 - 2012/11/26

N2 - We present a nondestructive characterization method for buried hetero-interfaces for organic/organic and metal/organic systems using hard x-ray photoelectron spectroscopy (HAXPES) which can probe electronic states at depths deeper than ∼10 nm. A significant interface-derived signal showing a strong chemical interaction is observed for Au deposited onto a C60 film, while there is no such additional feature for copper phthalocyanine deposited onto a C60 film reflecting the weak interaction between the molecules in the latter case. A depth analysis with HAXPES reveals that a Au-C 60 intermixed layer with a thickness of 5.1 nm is formed at the interface.

AB - We present a nondestructive characterization method for buried hetero-interfaces for organic/organic and metal/organic systems using hard x-ray photoelectron spectroscopy (HAXPES) which can probe electronic states at depths deeper than ∼10 nm. A significant interface-derived signal showing a strong chemical interaction is observed for Au deposited onto a C60 film, while there is no such additional feature for copper phthalocyanine deposited onto a C60 film reflecting the weak interaction between the molecules in the latter case. A depth analysis with HAXPES reveals that a Au-C 60 intermixed layer with a thickness of 5.1 nm is formed at the interface.

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Probing buried organic-organic and metal-organic heterointerfaces by hard x-ray photoelectron spectroscopy

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