Property of plasma-polymerized fluorocarbon film in relation to CH4/C4F8 ratio and substrate temperature

Yoshinori Matsumoto, Makoto Ishida

研究成果: Conference article査読

55 被引用数 (Scopus)

抄録

This paper shows the systematic study on the property of plasma-polymerized fluorocarbon (PPFC) film formed by a capacitive coupling-type plasma polymerization equipment using a mixture of CH4/C4F8 gas. The thermal stability of PPFC film was improved with substrate temperature. CH4 gas was supplied with C4F8 gas in order to increase the deposition rate. The deposition rate of a few nanometers per minute was obtained at substrate temperature of 200 °C by the addition of 20% CH4 gas. The PPFC film showed residual thickness of 80% and water contact angle of 110° even after 20 min annealing at 350 °C in air. The electrical breakdown strength of the film was measured as 0.7-1.3 MV/cm using mercury probe. The PPFC film was effective to prevent `in-use stiction', whose effect was confirmed by a touching test using the electrostatic force for an SOI accelerometer. As another interesting phenomenon, ultra hydrophobic surface (its water contact angle was over 150°) was obtained using the `powder-like' PPFC film, and it was explained by a fractal theory.

本文言語English
ページ(範囲)179-185
ページ数7
ジャーナルSensors and Actuators, A: Physical
83
1
DOI
出版ステータスPublished - 2000 5 22
イベントThe 10th International Conference on Solid-State Sensors and Actuators TRANSDUCERS '99 - Sendai, Jpn
継続期間: 1999 6 71999 6 10

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 器械工学
  • 凝縮系物理学
  • 表面、皮膜および薄膜
  • 金属および合金
  • 電子工学および電気工学

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