Refractive index lithography materials based on chemically amplified reaction

Takashi Yamashita, Atsushi Nara, Tomomi Fujimoto, Kunihiko Okano

研究成果: Article査読

2 被引用数 (Scopus)

抄録

Refractive index lithography was performed on polymer films consist of a photo-acid generator (PAG), t-BOC-protected naphthazarine as an acid chromic dye. The key reaction is the chemically amplified de-protection of the t-BOC group, by which color of the material change followed by refractive index change. Naphthazarine-containing polymer was also prepared. The induced refractive index was as large as 4×10-3, which is enough large to apply to optical waveguide fabrication.

本文言語English
ページ(範囲)783-787
ページ数5
ジャーナルJournal of Photopolymer Science and Technology
22
6
DOI
出版ステータスPublished - 2010 1

ASJC Scopus subject areas

  • ポリマーおよびプラスチック
  • 有機化学
  • 材料化学

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