Scalable fabrication of microneedle arrays via spatially controlled UV exposure

Hidetoshi Takahashi, Yun Jung Heo, Nobuchika Arakawa, Tesuo Kan, Kiyoshi Matsumoto, Ryuji Kawano, Isao Shimoyama

研究成果: Article

7 引用 (Scopus)

抄録

This paper describes a theoretical estimation of the geometry of negative epoxy-resist microneedles prepared via inclined/rotated ultraviolet (UV) lithography based on spatially controlled UV exposure doses. In comparison with other methods based on UV lithography, the present method can create microneedle structures with high scalability. When negative photoresist is exposed to inclined/rotated UV through circular mask patterns, a three-dimensional, needle-shaped distribution of the exposure dose forms in the irradiated region. Controlling the inclination angles and the exposure dose modifies the photo-polymerized portion of the photoresist, thus allowing the variation of the heights and contours of microneedles formed by using the same mask patterns. In an experimental study, the dimensions of the fabricated needles agreed well with the theoretical predictions for varying inclination angles and exposure doses. These results demonstrate that our theoretical approach can provide a simple route for fabricating microneedles with on-demand geometry. The fabricated microneedles can be used as solid microneedles or as a mold master for dissolving microneedles, thus simplifying the microneedle fabrication process. We envision that this method can improve fabrication accuracy and reduce fabrication cost and time, thereby facilitating the practical applications of microneedle-based drug delivery technology.

元の言語English
記事番号16049
ジャーナルMicrosystems and Nanoengineering
2
DOI
出版物ステータスPublished - 2016 1 1
外部発表Yes

Fingerprint

Photoresists
Fabrication
Needles
dosage
Lithography
fabrication
Masks
photoresists
needles
inclination
masks
lithography
Geometry
Drug delivery
Scalability
geometry
delivery
dissolving
drugs
routes

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Industrial and Manufacturing Engineering
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Materials Science (miscellaneous)

これを引用

Scalable fabrication of microneedle arrays via spatially controlled UV exposure. / Takahashi, Hidetoshi; Heo, Yun Jung; Arakawa, Nobuchika; Kan, Tesuo; Matsumoto, Kiyoshi; Kawano, Ryuji; Shimoyama, Isao.

:: Microsystems and Nanoengineering, 巻 2, 16049, 01.01.2016.

研究成果: Article

Takahashi, Hidetoshi ; Heo, Yun Jung ; Arakawa, Nobuchika ; Kan, Tesuo ; Matsumoto, Kiyoshi ; Kawano, Ryuji ; Shimoyama, Isao. / Scalable fabrication of microneedle arrays via spatially controlled UV exposure. :: Microsystems and Nanoengineering. 2016 ; 巻 2.
@article{0fdbe407b71142a0bd09f4e9f386a0ba,
title = "Scalable fabrication of microneedle arrays via spatially controlled UV exposure",
abstract = "This paper describes a theoretical estimation of the geometry of negative epoxy-resist microneedles prepared via inclined/rotated ultraviolet (UV) lithography based on spatially controlled UV exposure doses. In comparison with other methods based on UV lithography, the present method can create microneedle structures with high scalability. When negative photoresist is exposed to inclined/rotated UV through circular mask patterns, a three-dimensional, needle-shaped distribution of the exposure dose forms in the irradiated region. Controlling the inclination angles and the exposure dose modifies the photo-polymerized portion of the photoresist, thus allowing the variation of the heights and contours of microneedles formed by using the same mask patterns. In an experimental study, the dimensions of the fabricated needles agreed well with the theoretical predictions for varying inclination angles and exposure doses. These results demonstrate that our theoretical approach can provide a simple route for fabricating microneedles with on-demand geometry. The fabricated microneedles can be used as solid microneedles or as a mold master for dissolving microneedles, thus simplifying the microneedle fabrication process. We envision that this method can improve fabrication accuracy and reduce fabrication cost and time, thereby facilitating the practical applications of microneedle-based drug delivery technology.",
keywords = "Inclined/rotated lithography, Microneedle array, UV exposure ratio",
author = "Hidetoshi Takahashi and Heo, {Yun Jung} and Nobuchika Arakawa and Tesuo Kan and Kiyoshi Matsumoto and Ryuji Kawano and Isao Shimoyama",
year = "2016",
month = "1",
day = "1",
doi = "10.1038/micronano.2016.49",
language = "English",
volume = "2",
journal = "Microsystems and Nanoengineering",
issn = "2055-7434",
publisher = "Nature Publishing Group",

}

TY - JOUR

T1 - Scalable fabrication of microneedle arrays via spatially controlled UV exposure

AU - Takahashi, Hidetoshi

AU - Heo, Yun Jung

AU - Arakawa, Nobuchika

AU - Kan, Tesuo

AU - Matsumoto, Kiyoshi

AU - Kawano, Ryuji

AU - Shimoyama, Isao

PY - 2016/1/1

Y1 - 2016/1/1

N2 - This paper describes a theoretical estimation of the geometry of negative epoxy-resist microneedles prepared via inclined/rotated ultraviolet (UV) lithography based on spatially controlled UV exposure doses. In comparison with other methods based on UV lithography, the present method can create microneedle structures with high scalability. When negative photoresist is exposed to inclined/rotated UV through circular mask patterns, a three-dimensional, needle-shaped distribution of the exposure dose forms in the irradiated region. Controlling the inclination angles and the exposure dose modifies the photo-polymerized portion of the photoresist, thus allowing the variation of the heights and contours of microneedles formed by using the same mask patterns. In an experimental study, the dimensions of the fabricated needles agreed well with the theoretical predictions for varying inclination angles and exposure doses. These results demonstrate that our theoretical approach can provide a simple route for fabricating microneedles with on-demand geometry. The fabricated microneedles can be used as solid microneedles or as a mold master for dissolving microneedles, thus simplifying the microneedle fabrication process. We envision that this method can improve fabrication accuracy and reduce fabrication cost and time, thereby facilitating the practical applications of microneedle-based drug delivery technology.

AB - This paper describes a theoretical estimation of the geometry of negative epoxy-resist microneedles prepared via inclined/rotated ultraviolet (UV) lithography based on spatially controlled UV exposure doses. In comparison with other methods based on UV lithography, the present method can create microneedle structures with high scalability. When negative photoresist is exposed to inclined/rotated UV through circular mask patterns, a three-dimensional, needle-shaped distribution of the exposure dose forms in the irradiated region. Controlling the inclination angles and the exposure dose modifies the photo-polymerized portion of the photoresist, thus allowing the variation of the heights and contours of microneedles formed by using the same mask patterns. In an experimental study, the dimensions of the fabricated needles agreed well with the theoretical predictions for varying inclination angles and exposure doses. These results demonstrate that our theoretical approach can provide a simple route for fabricating microneedles with on-demand geometry. The fabricated microneedles can be used as solid microneedles or as a mold master for dissolving microneedles, thus simplifying the microneedle fabrication process. We envision that this method can improve fabrication accuracy and reduce fabrication cost and time, thereby facilitating the practical applications of microneedle-based drug delivery technology.

KW - Inclined/rotated lithography

KW - Microneedle array

KW - UV exposure ratio

UR - http://www.scopus.com/inward/record.url?scp=85019865899&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85019865899&partnerID=8YFLogxK

U2 - 10.1038/micronano.2016.49

DO - 10.1038/micronano.2016.49

M3 - Article

AN - SCOPUS:85019865899

VL - 2

JO - Microsystems and Nanoengineering

JF - Microsystems and Nanoengineering

SN - 2055-7434

M1 - 16049

ER -