Self-focusing 3D lithography with varying refractive index polyethylene glycol diacrylate

Hidetoshi Takahashi, Tetsuo Kan, Gayeong Lee, Nilsu Dönmez, Jieun Kim, Jihoon Park, Dongwook Kim, Yun Jung Heo

研究成果: Article査読

抄録

This work presents self-focusing 3D lithography based on the refractive index changes of polyethylene glycol diacrylate (PEGDA) during photopolymerization. Since the polymerization of PEGDA leads to an increase in the refractive index, the UV light rays in the PEGDA undergo a refraction effect during exposure, thus being focused and forming 3D photopolymerized structures. We demonstrate the potential of self-focusing 3D lithography by fabricating PEGDA microneedles and trapezoid-shaped microwells. Their structures well match our theoretical estimation. Therefore, our theoretical approach can provide a short route to realizing on-demand, complicated 3D structures of refractive-index-variable materials with single UV exposure.

本文言語English
論文番号076503
ジャーナルApplied Physics Express
13
7
DOI
出版ステータスPublished - 2020 7 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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