Simulation of rayleigh bubble growth near a no-slip rigid wall

Tomoya Tanaka, Keita Ando

研究成果: Conference contribution

1 被引用数 (Scopus)

抄録

In order to study the role of growing cavitation bubbles in the context of ultrasonic.

cleaning, we perform two-dimensional, axisymmetric Navier-Stokes simulation for compressible, multicomponent flow and examine the so-called Rayleigh growth of an air bubble (with initial radius 33 μm and pressure 10 MPa) near a rigid wall. The simulation suggests that strong shear stress, which is important in physical cleaning such as particle removal, appears as a result of the bubble-growthinduced shock passage. The parametric study with varying a standoff distance of the bubble to the wall shows that the wall shear stress linearly decreases against the standoff distance.

本文言語English
ホスト出版物のタイトルUltra Clean Processing of Semiconductor Surfaces XV - Selected peer-reviewed full text papers from the 15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021
編集者Paul W. Mertens, Kurt Wostyn, Marc Meuris, Marc Heyns
出版社Trans Tech Publications Ltd
ページ192-196
ページ数5
ISBN(印刷版)9783035738018
DOI
出版ステータスPublished - 2021
イベント15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021 - Mechelen, Belgium
継続期間: 2021 4 122021 4 15

出版物シリーズ

名前Solid State Phenomena
314 SSP
ISSN(印刷版)1012-0394
ISSN(電子版)1662-9779

Conference

Conference15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021
国/地域Belgium
CityMechelen
Period21/4/1221/4/15

ASJC Scopus subject areas

  • 原子分子物理学および光学
  • 材料科学(全般)
  • 凝縮系物理学

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