In order to study the role of growing cavitation bubbles in the context of ultrasonic.
cleaning, we perform two-dimensional, axisymmetric Navier-Stokes simulation for compressible, multicomponent flow and examine the so-called Rayleigh growth of an air bubble (with initial radius 33 μm and pressure 10 MPa) near a rigid wall. The simulation suggests that strong shear stress, which is important in physical cleaning such as particle removal, appears as a result of the bubble-growthinduced shock passage. The parametric study with varying a standoff distance of the bubble to the wall shows that the wall shear stress linearly decreases against the standoff distance.
|ホスト出版物のタイトル||Ultra Clean Processing of Semiconductor Surfaces XV - Selected peer-reviewed full text papers from the 15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021|
|編集者||Paul W. Mertens, Kurt Wostyn, Marc Meuris, Marc Heyns|
|出版社||Trans Tech Publications Ltd|
|出版ステータス||Published - 2021|
|イベント||15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021 - Mechelen, Belgium|
継続期間: 2021 4 12 → 2021 4 15
|名前||Solid State Phenomena|
|Conference||15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2021|
|Period||21/4/12 → 21/4/15|
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
- Materials Science(all)
- Condensed Matter Physics