SiO2 clad active and passive photonic crystal nanocavity devices fabricated with photolithography Toward future mass production of photonic crystal nanocavity devices

Nurul Ashikin Binti Daud; Yuta Ooka; Tomohisa Tabata; Tomohiro Tetsumoto; Takasumi Tanabe

doi:10.1109/CLEOPR.2017.8119006

SiO₂ clad active and passive photonic crystal nanocavity devices fabricated with photolithography Toward future mass production of photonic crystal nanocavity devices

Nurul Ashikin Binti Daud, Yuta Ooka, Tomohisa Tabata, Tomohiro Tetsumoto, Takasumi Tanabe

研究成果: Conference contribution

1 被引用数 (Scopus)

抄録

We describe the fabrication and a demonstration of passive and active photonic crystal nanocavity devices, namely an electro-optic modulator, an all-silicon photodetector and a DeMUX filter. This is the first demonstration of active and passive photonic crystal nanocavity devices fabricated with a photolithographic process that may lead to future mass production.

本文言語	English
ホスト出版物のタイトル	2017 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2017
出版社	Institute of Electrical and Electronics Engineers Inc.
ページ	1-2
ページ数	2
巻	2017-January
ISBN（電子版）	9781509062904
DOI	https://doi.org/10.1109/CLEOPR.2017.8119006
出版ステータス	Published - 2017 11月 22
イベント	2017 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2017 - Singapore, Singapore 継続期間: 2017 7月 31 → 2017 8月 4

Other

Other	2017 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2017
国/地域	Singapore
City	Singapore
Period	17/7/31 → 17/8/4

ASJC Scopus subject areas

コンピュータネットワークおよび通信
電子材料、光学材料、および磁性材料
原子分子物理学および光学

文献へのアクセス

10.1109/CLEOPR.2017.8119006

他のファイルとリンク

フィンガープリント

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引用スタイル

Daud, N. A. B., Ooka, Y., Tabata, T., Tetsumoto, T., & Tanabe, T. (2017). SiO₂ clad active and passive photonic crystal nanocavity devices fabricated with photolithography Toward future mass production of photonic crystal nanocavity devices. In 2017 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2017 (Vol. 2017-January, pp. 1-2). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/CLEOPR.2017.8119006

SiO₂ clad active and passive photonic crystal nanocavity devices fabricated with photolithography Toward future mass production of photonic crystal nanocavity devices. / Daud, Nurul Ashikin Binti; Ooka, Yuta; Tabata, Tomohisa その他.
2017 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2017. Vol. 2017-January Institute of Electrical and Electronics Engineers Inc., 2017. p. 1-2.

研究成果: Conference contribution

Daud, NAB, Ooka, Y, Tabata, T, Tetsumoto, T & Tanabe, T 2017, SiO₂ clad active and passive photonic crystal nanocavity devices fabricated with photolithography Toward future mass production of photonic crystal nanocavity devices. in 2017 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2017. vol. 2017-January, Institute of Electrical and Electronics Engineers Inc., pp. 1-2, 2017 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2017, Singapore, Singapore, 17/7/31. https://doi.org/10.1109/CLEOPR.2017.8119006

Daud NAB, Ooka Y, Tabata T, Tetsumoto T, Tanabe T. SiO₂ clad active and passive photonic crystal nanocavity devices fabricated with photolithography Toward future mass production of photonic crystal nanocavity devices. In 2017 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2017. Vol. 2017-January. Institute of Electrical and Electronics Engineers Inc. 2017. p. 1-2 doi: 10.1109/CLEOPR.2017.8119006

Daud, Nurul Ashikin Binti ; Ooka, Yuta ; Tabata, Tomohisa その他. / SiO₂ clad active and passive photonic crystal nanocavity devices fabricated with photolithography Toward future mass production of photonic crystal nanocavity devices. 2017 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2017. Vol. 2017-January Institute of Electrical and Electronics Engineers Inc., 2017. pp. 1-2

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AU - Tetsumoto, Tomohiro

AU - Tanabe, Takasumi

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