TY - GEN
T1 - Stress limited scaling in Ge2Sb2Te5
AU - Simpson, Robert E.
AU - Krbal, Milos
AU - Fons, Paul J.
AU - Kolobov, Alexander V.
AU - Uruga, Tomoya
AU - Tanida, Hajime
AU - Tominaga, Junji
PY - 2010/12/1
Y1 - 2010/12/1
N2 - The influence of stress on the phase change behaviour of Ge 2Sb2Te5 encapsulated by ZnSSiO2 and TiN is investigated using temperature dependent Extended X-ray Asbsorption Fines Structure and Ellipsometry to determine the crystallisation temperature. The encapsulation material surrounding the Ge2Sb2Te 5 has an increasingly dominant effect on the material's ability to change phase and can cause a profound increase in its crystallization temperature. We have experimentally shown that the increased crystallization temperature originates from compressive stress exerted from the encapsulation material. By minimizing the stress we have maintained the bulk crystallization temperature in Ge2Sb2Te5 films just 2 nm thick.
AB - The influence of stress on the phase change behaviour of Ge 2Sb2Te5 encapsulated by ZnSSiO2 and TiN is investigated using temperature dependent Extended X-ray Asbsorption Fines Structure and Ellipsometry to determine the crystallisation temperature. The encapsulation material surrounding the Ge2Sb2Te 5 has an increasingly dominant effect on the material's ability to change phase and can cause a profound increase in its crystallization temperature. We have experimentally shown that the increased crystallization temperature originates from compressive stress exerted from the encapsulation material. By minimizing the stress we have maintained the bulk crystallization temperature in Ge2Sb2Te5 films just 2 nm thick.
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M3 - Conference contribution
AN - SCOPUS:79951968750
SN - 9781617822186
T3 - Materials Research Society Symposium Proceedings
SP - 13
EP - 18
BT - Phase-Change Materials for Memory and Reconfigurable Electronics Applications
T2 - 2010 MRS Spring Meeting
Y2 - 5 April 2010 through 9 April 2010
ER -