Structure and optical characterization of nanocrystalline silicon thin films for solar cells

Ryo Morisawa, Akira Shirakura, Chen Chung Du, Jen Rong Huang, Muh Wang Liang, David Ch Wu, Tetsuya Suzuki

研究成果: Conference contribution

1 引用 (Scopus)

抜粋

Effects of very high frequency- plasma enhanced chemical vapor deposition (VHF-PECVD) using diluted ultrapure silane at higher dilution ratio (R>30) on microstructures and optical characteristics of hydrogenated nanocrystalline silicon (nc-Si:H) film were studied. Nanocrystalline silicon films were prepared by at RF power ranging from 50 to 300 W. It was found that the transition from amorphous phase to nanocrystalline phase occurred between 100 W and 150 W. The nucleation mechanism toward nc-Si:H near the transition point of amorphous phase was discussed based on transmission electron microscopy with atomic scale. Further, it is suggested from UV-visible spectroscopy that nc-Si:H films with the best optical properties would be obtained near the transition point from the amorphous phase to the crystalline phase.

元の言語English
ホスト出版物のタイトルAdvanced Nanostructured Solar Cells
ページ128-133
ページ数6
出版物ステータスPublished - 2010
イベント2009 MRS Fall Meeting - Boston, MA, United States
継続期間: 2009 11 302009 12 4

出版物シリーズ

名前Materials Research Society Symposium Proceedings
1211
ISSN(印刷物)0272-9172

Other

Other2009 MRS Fall Meeting
United States
Boston, MA
期間09/11/3009/12/4

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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  • これを引用

    Morisawa, R., Shirakura, A., Du, C. C., Huang, J. R., Liang, M. W., Wu, D. C., & Suzuki, T. (2010). Structure and optical characterization of nanocrystalline silicon thin films for solar cells. : Advanced Nanostructured Solar Cells (pp. 128-133). (Materials Research Society Symposium Proceedings; 巻数 1211).