Study of ion-ion plasma formation in negative ion sources by a three-dimensional in real space and three-dimensional in velocity space particle in cell model

S. Nishioka, I. Goto, K. Miyamoto, Akiyoshi Hatayama, A. Fukano

研究成果: Article

20 引用 (Scopus)

抄録

Recently, in large-scale hydrogen negative ion sources, the experimental results have shown that ion-ion plasma is formed in the vicinity of the extraction hole under the surface negative ion production case. The purpose of this paper is to clarify the mechanism of the ion-ion plasma formation by our three dimensional particle-in-cell simulation. In the present model, the electron loss along the magnetic filter field is taken into account by the " τ///τâS¥ model." The simulation results show that the ion-ion plasma formation is due to the electron loss along the magnetic filter field. Moreover, the potential profile for the ion-ion plasma case has been looked into carefully in order to discuss the ion-ion plasma formation. Our present results show that the potential drop of the virtual cathode in front of the plasma grid is large when the ion-ion plasma is formed. This tendency has been explained by a relationship between the virtual cathode depth and the net particle flux density at the virtual cathode.

元の言語English
記事番号023302
ジャーナルJournal of Applied Physics
119
発行部数2
DOI
出版物ステータスPublished - 2016 1 14

Fingerprint

negative ions
ion sources
cells
ions
cathodes
particle flux density
filters
hydrogen ions
tendencies
electrons
simulation
grids

ASJC Scopus subject areas

  • Physics and Astronomy(all)

これを引用

Study of ion-ion plasma formation in negative ion sources by a three-dimensional in real space and three-dimensional in velocity space particle in cell model. / Nishioka, S.; Goto, I.; Miyamoto, K.; Hatayama, Akiyoshi; Fukano, A.

:: Journal of Applied Physics, 巻 119, 番号 2, 023302, 14.01.2016.

研究成果: Article

@article{fdb550f7b3944b949165100144f80b66,
title = "Study of ion-ion plasma formation in negative ion sources by a three-dimensional in real space and three-dimensional in velocity space particle in cell model",
abstract = "Recently, in large-scale hydrogen negative ion sources, the experimental results have shown that ion-ion plasma is formed in the vicinity of the extraction hole under the surface negative ion production case. The purpose of this paper is to clarify the mechanism of the ion-ion plasma formation by our three dimensional particle-in-cell simulation. In the present model, the electron loss along the magnetic filter field is taken into account by the {"} τ///τ{\^a}S¥ model.{"} The simulation results show that the ion-ion plasma formation is due to the electron loss along the magnetic filter field. Moreover, the potential profile for the ion-ion plasma case has been looked into carefully in order to discuss the ion-ion plasma formation. Our present results show that the potential drop of the virtual cathode in front of the plasma grid is large when the ion-ion plasma is formed. This tendency has been explained by a relationship between the virtual cathode depth and the net particle flux density at the virtual cathode.",
author = "S. Nishioka and I. Goto and K. Miyamoto and Akiyoshi Hatayama and A. Fukano",
year = "2016",
month = "1",
day = "14",
doi = "10.1063/1.4939467",
language = "English",
volume = "119",
journal = "Journal of Applied Physics",
issn = "0021-8979",
publisher = "American Institute of Physics Publising LLC",
number = "2",

}

TY - JOUR

T1 - Study of ion-ion plasma formation in negative ion sources by a three-dimensional in real space and three-dimensional in velocity space particle in cell model

AU - Nishioka, S.

AU - Goto, I.

AU - Miyamoto, K.

AU - Hatayama, Akiyoshi

AU - Fukano, A.

PY - 2016/1/14

Y1 - 2016/1/14

N2 - Recently, in large-scale hydrogen negative ion sources, the experimental results have shown that ion-ion plasma is formed in the vicinity of the extraction hole under the surface negative ion production case. The purpose of this paper is to clarify the mechanism of the ion-ion plasma formation by our three dimensional particle-in-cell simulation. In the present model, the electron loss along the magnetic filter field is taken into account by the " τ///τâS¥ model." The simulation results show that the ion-ion plasma formation is due to the electron loss along the magnetic filter field. Moreover, the potential profile for the ion-ion plasma case has been looked into carefully in order to discuss the ion-ion plasma formation. Our present results show that the potential drop of the virtual cathode in front of the plasma grid is large when the ion-ion plasma is formed. This tendency has been explained by a relationship between the virtual cathode depth and the net particle flux density at the virtual cathode.

AB - Recently, in large-scale hydrogen negative ion sources, the experimental results have shown that ion-ion plasma is formed in the vicinity of the extraction hole under the surface negative ion production case. The purpose of this paper is to clarify the mechanism of the ion-ion plasma formation by our three dimensional particle-in-cell simulation. In the present model, the electron loss along the magnetic filter field is taken into account by the " τ///τâS¥ model." The simulation results show that the ion-ion plasma formation is due to the electron loss along the magnetic filter field. Moreover, the potential profile for the ion-ion plasma case has been looked into carefully in order to discuss the ion-ion plasma formation. Our present results show that the potential drop of the virtual cathode in front of the plasma grid is large when the ion-ion plasma is formed. This tendency has been explained by a relationship between the virtual cathode depth and the net particle flux density at the virtual cathode.

UR - http://www.scopus.com/inward/record.url?scp=84954154974&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84954154974&partnerID=8YFLogxK

U2 - 10.1063/1.4939467

DO - 10.1063/1.4939467

M3 - Article

AN - SCOPUS:84954154974

VL - 119

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

IS - 2

M1 - 023302

ER -