Study of the structure in rf glow discharges in SiH₄/H ₂ by spatiotemporal optical emission spectroscopy: Influence of negative ions

Physics & Astronomy

• optical emission spectroscopy 100%
• negative ions 90%
• glow discharges 87%
• electron attachment 43%
• positive ions 37%
• electrons 36%
• excitation 33%
• modulation 23%
• plasma sheaths 22%
• radiative lifetime 20%
• silanes 18%
• bombardment 16%
• light emission 16%
• amorphous silicon 16%
• radio frequencies 15%
• low frequencies 12%
• thresholds 10%
• energy 10%
• profiles 9%
• ions 8%