Substrate dependence of self-assembly of alkanethiol: X-ray absorption fine structure study

H. Kondoh, A. Nambu, Y. Ehara, F. Matsui, T. Yokoyama, T. Ohta

研究成果: Article査読

21 被引用数 (Scopus)

抄録

We have investigated effects of substrates on self-assembly of alkanethiol molecules by means of X-ray absorption fine structure spectroscopy. Molecular orientation of hexanethiolate adsorbed on various substrates such as Cu(111), Ag(111), Ag(100), Si(111), and their oxygen-covered surfaces has been explored by C K-edge and S K-edge near-edge X-ray absorption fine structure (NEXAFS). It was revealed that the alkylchain orientation is not correlated to the S-C bond orientation but primarily determined by the molecular density that definitely depends on the substrate surface. Precovered oxygen overlayers do not prevent thiol molecules from being adsorbed but promote their adsorption rate. The surface oxygen atoms are removed via formation and desorption of H2O. The interface structure of a hexanethiolate monolayer on O/Cu(100) has been studied in detail by use of S K-edge surface extended X-ray absorption fine structure (SEXAFS). The SEXAFS results indicated that hexanethiol adsorption induces a lateral displacement of surface Cu atoms toward the sulfur atom of the thiolate with a concomitant breaking of the -O-Cu-O- one-dimensional chain.

本文言語English
ページ(範囲)12946-12954
ページ数9
ジャーナルJournal of Physical Chemistry B
108
34
DOI
出版ステータスPublished - 2004 8 26
外部発表はい

ASJC Scopus subject areas

  • 物理化学および理論化学
  • 表面、皮膜および薄膜
  • 材料化学

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