抄録
Stacking sequence and relaxation of the natural MoS2(001) surface structure were determined with coaxial impact collision ion scattering spectroscopy (CAICISS) under ultra high vacuum. We concluded that the surface stacking sequence of MoS2 is hexagonal and there is no lateral translation of atomic layers near the surface. We also determined that the interlayer spacing contracts by 3.6 ± 0.4% for the top interlayer (d12) and by 0 to 2% for the subsequent interlayer (d23).
本文言語 | English |
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ページ(範囲) | 396-399 |
ページ数 | 4 |
ジャーナル | Surface Science |
巻 | 287-288 |
号 | PART 1 |
DOI | |
出版ステータス | Published - 1993 5月 10 |
外部発表 | はい |
ASJC Scopus subject areas
- 凝縮系物理学
- 表面および界面
- 表面、皮膜および薄膜
- 材料化学