Ternary nitride films synthesized by cathodic arc method

H. Hasegawa, M. Kawate, A. K. Hashimoto, T. Suzuki

研究成果: Chapter

2 被引用数 (Scopus)

抄録

This chapter discusses the maximum hardness of ternary nitride films with particular 'x' value based on the phase transition, analyzed by the X-ray diffraction method and transmission electron microscopy. Changes in microstructures and corresponding physical properties of ternary nitride films and Zrl-xAlxN are focused on micro-hardness with respect to different 'x' value. The crystal structure and lattice parameter of ternary films change with 'x' value and their physical properties correspondingly change as well. It is well known that the metastable PVD films is developed by incorporating second metals to binary nitride films in aims of gaining excellent properties. It is reported that the Ti1-x AlxN films are alternative to TiN due to higher hardness and better cutting performance. The solubility of AlN to TiN is investigated by several researches using the X-ray diffraction method.

本文言語English
ホスト出版物のタイトルNovel Materials Processing by Advanced Electromagnetic Energy Sources
出版社Elsevier
ページ437-440
ページ数4
ISBN(印刷版)9780080445045
DOI
出版ステータスPublished - 2005 12 1

ASJC Scopus subject areas

  • Energy(all)

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