The development of ambient pressure X-ray photoelectron spectroscopy and its application to surface science

Bongjin Simon Mun, Hiroshi Kondoh, Zhi Liu, Phil N. Ross, Zahid Hussain

研究成果: Chapter

4 被引用数 (Scopus)

抄録

Ambient pressure X-ray photoelectron spectroscopy (AP-XPS) is an emerging in situ spectroscopic technique which is creating a new road map in the world of surface science. AP-XPS is a powerful tool to investigate and help us to understand the electronic structures of surfaces and the chemical states of adsorbates and substrates under realistic conditions. The purpose of this report is to present the role of AP-XPS in surface science by reviewing the development and applications of AP-XPS. This chapter contains the brief history of AP-XPS, the latest progress in the instrumentation, and its recent results from noble model systems as well as practical real system in surface science. Also, the directions of future research using AP-XPS are discussed.

本文言語English
ホスト出版物のタイトルCurrent Trends of Surface Science and Catalysis
出版社Springer New York
ページ197-229
ページ数33
9781461487425
ISBN(電子版)9781461487425
ISBN(印刷版)1461487412, 9781461487418
DOI
出版ステータスPublished - 2013 7 1

ASJC Scopus subject areas

  • 化学 (全般)
  • 化学工学(全般)

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