The effect of the nitrogen plasma irradiation on ZnO single crystals

H. Maki, N. Ichinose, I. Sakaguchi, N. Ohashi, H. Haneda, J. Tanaka

研究成果: Conference article査読

3 被引用数 (Scopus)

抄録

The ZnO (0001) and (0001̄) surfaces irradiated with nitrogen using an electron cyclotron resonance (ECR) gun were studied with X-ray photoelectron spectroscopy (XPS). After annealed at 800°C, N ions remained on the surfaces in four states: i.e. NO, N2, the N species that has excess electrons like NH3 or N2, and the N ions that replaced O ions in ZnO lattice. The surface oxygen could be substituted with N ions that could affect N-doping and the heterogeneous growth of nitride thin films on ZnO.

本文言語English
ページ(範囲)61-64
ページ数4
ジャーナルKey Engineering Materials
216
出版ステータスPublished - 2001 1 1
外部発表はい
イベント20th Electronics Division Meeting of the Ceramic Society of Japan - Kawasaki, Japan
継続期間: 2000 10 262000 10 27

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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