The first demonstration of a 639-nm regenerative laser amplifier

Naoto Sugiyama, Shogo Fujita, Yusaku Hara, Fumihiko Kannari

研究成果: Conference contribution

抄録

High-power picosecond lasers in the visible and ultraviolet wavelength hold a lot of advantages in various applications. The high absorption efficiency in the various metals leads to the higher removal rates, and the shorter pulse widths can suppress thermal influence during the material processing. Recently, the significant progress in the output power of indium gallium nitride (InGaN)-based laser diodes (LDs) has developed the compact high-power lasers which oscillate directly in the visible wavelength. For example, a continuous-wave laser output power of >6.7 W at the fundamental wavelength of 639 nm was reported with a praseodymium-doped LiYF4 crystal (Pr:YLF) [1]. Moreover, mode-locked picosecond lasers were also reported using a SESAM saturable absorber with Pr:YLF lasers [2,3]. Further scaling of visible picosecond laser pulse requires an amplifier, but only few experiments were reported on the visible laser amplifiers [4]. For example, the maximum amplification factor of 10 was demonstrated at 478 nm [5]. In this paper, a 639-nm picosecond-pulse regenerative amplifier using a Pr:YLF crystal is demonstrated for the first time.

本文言語English
ホスト出版物のタイトル2019 Conference on Lasers and Electro-Optics Europe and European Quantum Electronics Conference, CLEO/Europe-EQEC 2019
出版社Institute of Electrical and Electronics Engineers Inc.
ISBN(電子版)9781728104690
DOI
出版ステータスPublished - 2019 6月
イベント2019 Conference on Lasers and Electro-Optics Europe and European Quantum Electronics Conference, CLEO/Europe-EQEC 2019 - Munich, Germany
継続期間: 2019 6月 232019 6月 27

出版物シリーズ

名前2019 Conference on Lasers and Electro-Optics Europe and European Quantum Electronics Conference, CLEO/Europe-EQEC 2019

Conference

Conference2019 Conference on Lasers and Electro-Optics Europe and European Quantum Electronics Conference, CLEO/Europe-EQEC 2019
国/地域Germany
CityMunich
Period19/6/2319/6/27

ASJC Scopus subject areas

  • 分光学
  • 電子材料、光学材料、および磁性材料
  • 器械工学
  • 原子分子物理学および光学
  • コンピュータ ネットワークおよび通信

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