The optical and magnetic properties of Ni+-implanted silica

Tetsuhiko Isobe, Seung Y. Park, Robert A. Weeks, Raymond A. Zuhr

研究成果: Article査読

50 被引用数 (Scopus)

抄録

Fused silica plates were implanted with 58Ni+ at room temperature to a dose of 6 × 1016 ions cm-2 under the condition of 160 keV and 3 μA cm-2. The changes in the optical and magnetic properties of Ni+-implanted silica by annealing at 800°C for 4 h in air, N2 and Ar with 4% H2 were measured to determine the chemical state of implanted nickel species. The absence of change in the depth distribution of Ni after annealing under these conditions indicates that nickel species did not dissolve in silica. The absorption band due to the surface plasmon resonance of Ni particles at ∼ 3.6 eV decreased and increased on annealing in air and Ar with 4% H2, respectively. The intensity of the ferromagnetic resonance signal measured at -196°C was larger than that at room temperature, both increasing with heat treatment. The resonance field depended on the angle between the implanted surface and the applied magnetic field. It is concluded that Ni particles embedded in silica by ion-implantation were magnetized in the plane normal to the ion beam and that super-paramagnetic Ni changed to ferromagnetic Ni during the thermal treatment.

本文言語English
ページ(範囲)173-180
ページ数8
ジャーナルJournal of Non-Crystalline Solids
189
1-2
DOI
出版ステータスPublished - 1995 8月 2
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • セラミックおよび複合材料
  • 凝縮系物理学
  • 材料化学

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