TY - JOUR
T1 - Theoretical Analysis of Electron-Beam-Excited KrF Laser Performance
T2 - New F2 Concentration Optimization
AU - Kannari, Fumihiko
AU - Suda, Akira
AU - Yamaguchi, Shigeru
AU - Obara, Minoru
AU - Fujioka, Tomoo
PY - 1983/2
Y1 - 1983/2
N2 - For an electron-beam-excited KrF laser, we analyzed theoretically the dependence of the performance characteristics on the excitation rate and initial F2 concentration. According to the analysis of KrF* formation processes, KrF* relaxation processes, 248 nm absorption processes, and their individual efficiencies, a novel optimization method for initial F2 concentrations is necessary instead of a conventional method of a “constant” F2 burn-up rate. Then, we determined optimum F2 concentration as a function of the excitation rate for excitation pulses of 20–500 ns FWHM. Finally, we obtained the scaling law for the intrinsic KrF laser efficiency.
AB - For an electron-beam-excited KrF laser, we analyzed theoretically the dependence of the performance characteristics on the excitation rate and initial F2 concentration. According to the analysis of KrF* formation processes, KrF* relaxation processes, 248 nm absorption processes, and their individual efficiencies, a novel optimization method for initial F2 concentrations is necessary instead of a conventional method of a “constant” F2 burn-up rate. Then, we determined optimum F2 concentration as a function of the excitation rate for excitation pulses of 20–500 ns FWHM. Finally, we obtained the scaling law for the intrinsic KrF laser efficiency.
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U2 - 10.1109/JQE.1983.1071830
DO - 10.1109/JQE.1983.1071830
M3 - Article
AN - SCOPUS:0020706068
SN - 0018-9197
VL - 19
SP - 232
EP - 242
JO - IEEE Journal of Quantum Electronics
JF - IEEE Journal of Quantum Electronics
IS - 2
ER -