Theoretical evaluation of a short-pulse electron-beam-excited XeF(B→X) laser using a low-pressure, room-temperature Ar/Xe/F2 gas mixture

Naoto Nishida, Toshiaki Takashima, Frank K. Tittel, Fumihiko Kannari, Minoru Obara

研究成果: Article査読

9 被引用数 (Scopus)

抄録

A simulation code for an electron-beam-excited XeF(B→X) laser using Ar/Xe/F2 gas mixtures is described. The validity of the code was checked by comparing the computed results to those obtained in a previously reported experiment with a 65-ns, 1.14-MW/cm3 excitation pulse. Good agreement is demonstrated for sidelight fluorescence, laser waveforms, output power, and energy. Furthermore, the simulation code analysis suggests that the XeF laser can be operated effectively with low-pressure (<1 atm) Ar/Xe/F 2 mixtures at room temperature. A maximum intrinsic efficiency of ∼3% is obtained at a total pressure of 0.5 atm. Such a low-pressure Ar/Xe/F2 laser gas mixture would permit operation of a scaled-up XeF laser system since the intrinsic efficiency is as high as that with conventional high-pressure (∼3 atm) Ne/Xe/NF3 mixtures.

本文言語English
ページ(範囲)3932-3940
ページ数9
ジャーナルJournal of Applied Physics
67
9
DOI
出版ステータスPublished - 1990

ASJC Scopus subject areas

  • 物理学および天文学(全般)

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