Thermal conductivity measurements of low-k films using thermoreflectance phenomenon

M. Kuwahara, O. Suzuki, S. Takada, N. Hata, P. Fons, J. Tominaga

研究成果: Article査読

11 被引用数 (Scopus)

抄録

The thermal conductivity of low-dielectric-constant (low-k) materials has been studied by a nano second thermoreflectance measurement system (Nano-TheMS). The Nano-TheMS, which utilizes thermoreflectance, can easily measure the thermal conductivity of thin film of nano-meter scale thickness. We have measured a series of low-k film samples with varying methyl group content. The methyl group content is a significant factor in determining the dielectric constant and mechanical strength of low-k materials. We have also measured the temperature dependence of the thermal conductivity from room temperature to 300 °C as this dependence is essential to simulate realistic temperature distributions inside integrated devices. It was found that its dependence is not remarkable but the thermal conductivity gradually increase with rising temperature.

本文言語English
ページ(範囲)796-799
ページ数4
ジャーナルMicroelectronic Engineering
85
5-6
DOI
出版ステータスPublished - 2008 5 1
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 原子分子物理学および光学
  • 凝縮系物理学
  • 表面、皮膜および薄膜
  • 電子工学および電気工学

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