Three-dimensional integration of heterogeneous silicon micro-structures by liftoff and stamping transfer

Hiroaki Onoe, Eiji Iwase, Kiyoshi Matsumoto, Isao Shimoyama

研究成果: Article査読

28 被引用数 (Scopus)

抄録

We propose a method of integrating heterogeneous silicon microstructures (typical scale of 10-100 νm) into a single silicon substrate to fabricate MEMS structures. It includes adhesion-based liftoff and stamping transfer (LIST) processes using poly-(dimethylsiloxane) (PDMS) sheets. Silicon microstructures fabricated on different wafers are lifted onto the PDMS sheets by breaking the narrow columns supporting the microstructures by applying a vertical load to the PDMS sheet, and then transferred onto the silicon substrate with high yield (more than 90%) and superior positioning accuracy (within 0.3 νm on average in a 2 × 3 mm area). Multiple heterogeneous silicon structures are integrated into a single silicon substrate by repeating this LIST process. We fabricated two-dimensional arrays, three-dimensional pyramidal structures and overhanging bridge microstructures with our method, which proved that the LIST process could be used to integrate heterogeneous MEMS structures into a single wafer.

本文言語English
ページ(範囲)1818-1827
ページ数10
ジャーナルJournal of Micromechanics and Microengineering
17
9
DOI
出版ステータスPublished - 2007 9 1
外部発表はい

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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