Three Dimensional Micro Fabrication of Photoresist and Resin Materials by Using Gray-scale Lithography and Molding

Ryotaro Mori, Kei Hanai, Yoshinori Matsumoto

研究成果: Article査読

13 被引用数 (Scopus)

抄録

Three dimensional structures on SU-8 photoresist were fabricated by gray-scale lithography. A thin glass substrate was plastered over with SU-8 and UV light was irradiated through the glass substrate. SU-8 structures with maximum 400 µm height and strong adhesion to the substrate were achieved by the lithography technique. The relation between gray-scale value and the resist height were evaluated and the maximum surface roughness of the structure was 0.98 µm. Three dimensional structures such as micro capillaries were fabricated on PDMS from the SU-8 structures by molding.

本文言語English
ページ(範囲)359-363
ページ数5
ジャーナルieej transactions on sensors and micromachines
124
10
DOI
出版ステータスPublished - 2006

ASJC Scopus subject areas

  • 機械工学
  • 電子工学および電気工学

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