Three Dimensional Structures of Negative-tone Photoresist by Binary Optics

Kei Hana, Sayaka Shimizu, Yoshinori Matsumoto

研究成果: Article査読

3 被引用数 (Scopus)

抄録

Binary optics is one of the effective methods to form three dimensional micro structure. In this study, Binary optics was applied to negative-tone photoresist of SU-8 with substrate penetration method, and three-dimensional structures with 16 levels were fabricated by 4 times exposure and development processes. We also propose the new technique to generate mask patterns for binary optics by image-processing which dramatically reduces effort of designing mask pattern. Keywords : binary optics, SU-8, substrate penetration method.

本文言語English
ページ(範囲)424-425
ページ数2
ジャーナルieej transactions on sensors and micromachines
125
10
DOI
出版ステータスPublished - 2005

ASJC Scopus subject areas

  • 機械工学
  • 電子工学および電気工学

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