Binary optics is one of the effective methods to form three dimensional micro structure. In this study, Binary optics was applied to negative-tone photoresist of SU-8 with substrate penetration method, and three-dimensional structures with 16 levels were fabricated by 4 times exposure and development processes. We also propose the new technique to generate mask patterns for binary optics by image-processing which dramatically reduces effort of designing mask pattern. Keywords : binary optics, SU-8, substrate penetration method.
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