Two-dimensional transport of submicron particles in capacitively coupled plasma reactor

Ryu Ichi Hashido, Masao Hasebe, Yoshiyuki Hosokawa, Nobuhiko Nakano, Yukio Yamaguchi, Toshiaki Makabe

研究成果: Article査読

3 被引用数 (Scopus)

抄録

We show a series of two-dimensional (2D) space distributions of submicron insulating particles in Ar rfcapacitively coupled plasma (CCP) as a function of time after injection by using a fluid model under the external conditions of 102 sccm < flow rate < 105 sccm and 10-8m < particle radius < 10-5 m at 13.56 MHz in Ar. The final density profile is strongly dependent on the flow rate. For low flow rates, the profile of density is disk shaped at low pressure and dome shaped at high pressure. As the flow rate increases, the profile becomes ring shaped, and finally all particles are exhausted. There is a linear relation between the flow rate and the minimum radius of a particle which can be exhausted. It was found that high pressure, low voltage and strong gas flow are the most effective for the purpose of exhausting particles from the reactor.

本文言語English
ページ(範囲)3707-3713
ページ数7
ジャーナルJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
36
6 A
DOI
出版ステータスPublished - 1997 6

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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