Ultrahigh- Q nanocavities written with a nanoprobe

Atsushi Yokoo, Takasumi Tanabe, Eiichi Kuramochi, Masaya Notomi

研究成果: Article査読

20 被引用数 (Scopus)

抄録

High-Q nanocavities have been extensively studied recently because they are considered key elements in low-power photonic devices and integrated circuits. Here we demonstrate that ultrahigh-Q (>106) nanocavities can be created by employing scanning probe lithography on a prepatterned line defect in a silicon photonic crystal. This is the first realization of ultrahigh-Q nanocavities by the postprocess modification of photonic crystals. With this method, we can form an ultrahigh-Q nanocavity with controllable cavity parameters at an arbitrary position along a line defect. Furthermore, the fabricated nanocavity achieves ultralow power all-optical bistable operation owing to its large cavity enhancement effect. This demonstration indicates the possibility of realizing photonic integrated circuits on demand, where various circuit patterns are written with a nanoprobe on a universal photonic crystal substrate.

本文言語English
ページ(範囲)3634-3642
ページ数9
ジャーナルNano Letters
11
9
DOI
出版ステータスPublished - 2011 9 14
外部発表はい

ASJC Scopus subject areas

  • バイオエンジニアリング
  • 化学 (全般)
  • 材料科学(全般)
  • 凝縮系物理学
  • 機械工学

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