Uniform areal-distribution of UV intensity by synchronizing signal-waveforms and position of a UV-LED array

Hidetoshi Takahashi, I. Shimoyama, Y. J. Heo

研究成果: Article査読

1 被引用数 (Scopus)

抄録

This paper describes a theoretical approach to give an irradiated area a uniform distribution of LED light intensity by synchronizing the signal waveforms and position control of the LEDs. Although UV-LEDs have attracted considerable attention as alternative light sources for ultraviolet (UV) lithography in Micro Electro Mechanical Systems (MEMS) fabrication, mainly because of their low cost and low power consumption, the realization of a uniform UV intensity over an area remains challenging. Here, we propose a method to achieve a uniform areal intensity within an irradiated area by synchronizing the signal waveform and position of a UV-LED array. To verify our theoretical calculation, we developed a system with a UV-LED array whose position is controlled by a linear actuator. The intensity of the UV-LED array is controlled by a pulse width modulation (PWM) signal, which is synchronized with the position of the linear actuator. Using this system, we fabricated 2D micropatterns and 3D microstructures with high uniformity in the irradiated area. The proposed method is expected to facilitate practical LED-based lithography in MEMS fabrication.

本文言語English
論文番号263503
ジャーナルApplied Physics Letters
111
26
DOI
出版ステータスPublished - 2017 12 25
外部発表はい

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

フィンガープリント 「Uniform areal-distribution of UV intensity by synchronizing signal-waveforms and position of a UV-LED array」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル